However, the usefulness of the tool extends well beyond just milling. Similar to an electron beam, an ion beam is capable of producing secondary electrons and backscattered ions. This ion beam can also serve as a tool for image acquisition. This is, of course, necessary for setting up milling applications, as any FIB user will attest. Imaging with the ion beam is not limited to setting up milling patterns; it can also be a useful tool for acquiring images with unique and enhanced contrast mechanisms compared to those acquired with an electron beam. Let’s look at one such application area where the ion beam excels: channelling contrast.
Because ions are much larger, more massive, and travelling at lower velocities than electrons, they have different interactions with the sample surface and different trajectories within the sample. The secondary electron yield from an ion beam is much more sensitive to crystallographic orientation than that of an electron beam. A contrast mechanism—referred to as channelling contrast—is much more prominent when imaging with the ion beam. As a result, images of material surfaces can have strong contrast due to grain orientation.